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Metal Corrosion of Al-Si-Cu Pattern Wafer Due to Chloride Ion Contaminants
Airborne molecular contaminants (AMCs) Chloride contamination Cleanroom micro-contamination HCl Pattern wafer Semiconductor device
2016/3/28
Chloride ions (Cl–) induce metal corrosion of integrated circuits and cause wafer scrap events in the clean room
environment. In this study, Al-Si-Cu pattern wafers were designed to monitor critical ...
The Influence of Gas Flare Particulates and Rainfall on the Corrosion of Galvanized Steel Roofs in the Niger Delta, Nigeria
Galvanized Iron Gas Flares Mass Loss Pollutants Rainfall
2013/3/13
An experiment was conducted to determine the influence of air-borne particulates exuded from gas flare chambers and rainfall/rain water pH in the rusting of metallic building materials, particularly t...