搜索结果: 1-1 共查到“光学仪器及技术 pressure”相关记录1条 . 查询时间(0.109 秒)
Atmospheric Pressure Deposition of Silica Thin Film by Photo-CVD Using Vacuum Ultraviolet Excimer Lamp
Excimer lamp Silica thin film TEOS
2009/6/8
It has been known that thin silica films can be deposited from TEOS {Si(OC2H5)4} by means of the photo-CVD (Chemical Vapor Deposition) technique using vacuum ultraviolet (VUV) light (VUV-CVD) at room ...