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Symbiotic Optimization of the Nanolithography and RF-Plasma Etching for Fabricating High-Quality Light-Sensitive Superconductors on the 50 nm Scale
Symbiotic Optimization Nanolithography High-Quality Light-Sensitive Superconductors
2010/11/24
We present results of a fabrication-process development for the lithographic pattern transfer into the nm100sub range by combining electron-beam lithography and reactive dry etching to obtain ...
Effect of oxygen plasma etching on graphene studied with Raman spectroscopy and electronic transport
Effect of oxygen plasma Raman spectroscopy electronic transport
2010/11/17
We report a study of graphene and graphene field effect devices after exposure to a series of short pulses of oxygen plasma. We present data from Raman spectroscopy, back-gated field-effect and magnet...